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Atomic Layer Deposition

Name: Atomic Layer Deposition
Brand: John Wiley & Sons Inc
SKU: 04949772
Price: 205.29 EUR
Availability: InStock
Author: Tommi Kaariainen
ISBN: 9781118062777

Principles, Characteristics, and Nanotechnology Applications

Tommi Kaariainen

David Cameron

Marja-Leena Kaariainen

Arthur Sherman

Jezik

Angleščina

Knjiga Trda

Koda Libristo: 04949772

Založba John Wiley & Sons Inc, junij 2013

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf... Celoten opis

Koda Libristo: 04949772

497 b

205.29 €

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.