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Atomic Layer Deposition

Name: Atomic Layer Deposition
Brand: Wiley-Scrivener
SKU: 39915569
Price: 212.01 EUR
Availability: InStock
Author: Tommi K&auml;&auml;ri&auml;inen
ISBN: 9781118747384

Tommi Kääriäinen

David Cameron

Marja-Leena Kääriäinen

Arthur Sherman

Jezik

Angleščina

E-knjiga Adobe ePub DRM

Koda Libristo: 39915569

Založba Wiley-Scrivener, maj 2013

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerf... Celoten opis

Koda Libristo: 39915569

512 b

212.01 €

Na zalogi Prenesi zdaj

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.